Please use this identifier to cite or link to this item: http://repository.aaup.edu/jspui/handle/123456789/3398
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dc.contributor.authorKhanfar, Hazem$AAUP$Palestinian-
dc.contributor.authorQasrawi, Atef$AAUP$Palestinian-
dc.contributor.authorAbu Alrob, Malak$AAUP$Palestinian-
dc.date.accessioned2025-06-25T06:39:37Z-
dc.date.available2025-06-25T06:39:37Z-
dc.date.issued2025-06-04-
dc.identifier.issn1841-7132-
dc.identifier.urihttp://repository.aaup.edu/jspui/handle/123456789/3398-
dc.description.abstractIn this study, Yb/p-Si/Yb Schottky devices were fabricated by thermally evaporating Yb contacts onto p-Si substrates under high vacuum, exhibiting MOS characteristics. These devices feature tunable flat band voltage and built-in potential under illumination, with a photo-controlled cutoff frequency spanning from the microwave to the terahertz regime. Functioning as microwave band filters, they show reflection coefficient, return loss, and voltage standing wave ratio values suitable for microwave resonators. Simulation suggests that optimizing resistance and capacitance enhances the reflection coefficient, return loss, and voltage standing wave ratio, improving performance for next-generation and terahertz applications.en_US
dc.language.isoenen_US
dc.publisherJOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALSen_US
dc.subject6Gen_US
dc.subjectPhoto-capacitorsen_US
dc.subjectSchottky barriersen_US
dc.subjectTerahertz filtersen_US
dc.subjectYb/p-Sien_US
dc.titleYtterbium based back-to-back Schottky diodes as light-activated MOS capacitors and high-frequency band filters for next-generation 6G applicationsen_US
dc.typeArticleen_US
Appears in Collections:Faculty & Staff Scientific Research publications

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